凯发

In order to accelerate the transformation of chemical vapor deposition (CVD) graphene into products, many different production routes have been explored in the past decade.  For example, multiple high quality mm to cm sized single crystal graphene island growth processes have been demonstrated at <500 mTorr LPCVD (with a H2/CH4 ratio of 4-2000) and APCVD (with a CH4 concentration between 10 and 500 ppm and H2 concentration between 2 and 25% with a balance of Ar). Our CVD graphene process enhancements and patent pending reactor design are compatible with most of these processes and allow for additional widening of the CVD graphene processing window.

Despite an intensive research effort, no clear superior CVD graphene process has been found. Therefore, research equipment requirements are constantly evolving as new process know-how becomes available. As a result, many low cost single purpose processing tools are destined to be obsolete and/or outdated in a short period of time.

The need to stay current with a rapidly evolving CVD processing field means that a multipurpose platform that is capable of running a wide range of graphene processes is desirable. We will discuss a route to achieve this versatility, with the option to also process other nanomaterials, including carbon nanotubes. We will additionally discuss how the same equipment platform can be used to manufacture a single R&D sample, multiple samples in parallel and rolls of Cu foils without the need to use a roll to roll system.