由于具有超高的载流子迁移率和饱和漂移速度,石墨烯被认为是制备高频器件的理想材料。但是石墨烯高频器件的制备仍然面临各种问题。首先,石墨烯表面缺乏悬挂键,难以沉积高质量低界面态的栅介质。其次,由于独特的线性能带结构和较低的电子态密度,金属石墨烯难以形成理想的欧姆接触。我们利用金属铝做种子层,外加高低温ALD沉积的方式实现了高质量、低界面态Al2O3栅介质在石墨烯表面的沉积。此外,我们还研究了接触区域石墨烯输运机制,通过不同区域费米能级调控降低金属石墨烯接触电阻。通过工艺的整合,我们制备出了高性能的石墨烯场效应晶体管,器件的截止频率达到500GHz。
CGIA supports members to focus on application and industry chain, to keep pace with market development, to guarantee industry interests by involving in policy making and establishing standards, and to build long-term cooperation with up-down stream enterprises all over the world.
E-mail: meeting@c-gia.org
Abstract: Minyang Lu
Sponsor: Wenyang Yang
Media: Liping Wang
Operated by:China Innovation Alliance of the Graphene Industry